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Extreme Ultraviolet Lithography
language: english
Publisher:
SPIE PRESS, December of 2020 ‧
see product details
SYNOPSIS
Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
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| Property | Description |
|---|---|
| ISBN: | 9781510639393 |
| Publisher: | SPIE PRESS |
| Release Date: | December of 2020 |
| Language: | English |
| Dimensions: | 252 x 176 x 16 mm |
| Cover: | Softcover |
| Pages: | 245 |
| Format: | Book |
| Collection: | Press Monographs |
| Categories: |
Books in English
>
Engineering
>
Electricity and Energy
Books in English > Others |
| EAN: | 9781510639393 |
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