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Spacer Engineered Finfet Architectures eBook
High-Performance Digital Circuit Applications
idioma: inglês
Editor:
CRC PRESS, junho de 2017 ‧
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68,89€
10% DESCONTO
CARTÃO
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DISPONIBILIDADE IMEDIATA
Ebook para ADE
SINOPSE
This book focusses on the spacer engineering aspects of novel MOS-based deviceâ€"circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
DETALHES
| Propriedade | Descrição |
|---|---|
| ISBN: | 9781351751049 |
| Editor: | CRC PRESS |
| Data de Lançamento: | junho de 2017 |
| Idioma: | Inglês |
| Tipo de produto: | eBook |
| Formato e Compatibilidade: | PDF para ADE |
| Classificação Temática: |
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| EAN: | 9781351751049 |
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