Spacer Engineered Finfet Architectures
High-Performance Digital Circuit Applications
idioma: inglês
Editor:
TAYLOR & FRANCIS INC, junho de 2017 ‧
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209,54€
10% DESCONTO
CARTÃO
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SINOPSE
This book focusses on the spacer engineering aspects of novel MOS-based deviceâ€"circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
DETALHES
| Propriedade | Descrição |
|---|---|
| ISBN: | 9781498783590 |
| Editor: | TAYLOR & FRANCIS INC |
| Data de Lançamento: | junho de 2017 |
| Idioma: | Inglês |
| Dimensões: | 156 x 235 x 20 mm |
| Encadernação: | Capa dura |
| Páginas: | 154 |
| Tipo de produto: | Livro |
| Classificação Temática: |
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| EAN: | 9781498783590 |