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Extreme Ultraviolet Lithography
idioma: inglês
Editor:
SPIE PRESS, dezembro de 2020 ‧
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70,30€
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SINOPSE
Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
DETALHES
| Propriedade | Descrição |
|---|---|
| ISBN: | 9781510639393 |
| Editor: | SPIE PRESS |
| Data de Lançamento: | dezembro de 2020 |
| Idioma: | Inglês |
| Dimensões: | 252 x 176 x 16 mm |
| Encadernação: | Capa mole |
| Páginas: | 245 |
| Tipo de produto: | Livro |
| Coleção: | Spie Press Monographs |
| Classificação Temática: |
Livros em Inglês
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Engenharia
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Eletricidade e Energia
Livros em Inglês > Outros |
| EAN: | 9781510639393 |
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