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Extreme Ultraviolet Lithography
idioma: inglês
Editor:
SPIE PRESS, dezembro de 2020 ‧
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70,30€
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SINOPSE
Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
DETALHES
| Propriedade | Descrição |
|---|---|
| ISBN: | 9781510639393 |
| Editor: | SPIE PRESS |
| Data de Lançamento: | dezembro de 2020 |
| Idioma: | Inglês |
| Dimensões: | 252 x 176 x 16 mm |
| Encadernação: | Capa mole |
| Páginas: | 245 |
| Tipo de produto: | Livro |
| Coleção: | Spie Press Monographs |
| Classificação Temática: |
Livros em Inglês
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Engenharia
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Eletricidade e Energia
Livros em Inglês > Outros |
| EAN: | 9781510639393 |
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