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Machine Learning-Based Modelling In Atomic Layer Deposition Processes

by Tien-Chien (University Of Johannesburg, South Africa) Jen, Sina Karimzadeh e Oluwatobi Adeleke
language: english
Publisher: TAYLOR & FRANCIS LTD, May of 2025 ‧
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Machine Learning-Based Modelling In Atomic Layer Deposition Processes

by Tien-Chien (University Of Johannesburg, South Africa) Jen, Sina Karimzadeh e Oluwatobi Adeleke

Property Description
ISBN: 9781032386737
Publisher: TAYLOR & FRANCIS LTD
Release Date: May of 2025
Language: English
Dimensions: 156 x 234 x 20 mm
Cover: Softcover
Pages: 354
Format: Book
Collection: Emerging Materials And Technologies
Categories: Books in English > Engineering > General Engineering
EAN: 9781032386737

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