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Euv Sources For Lithography
Euv Sources For Lithography
language: english
Publisher:
SPIE PRESS, February of 2006 ‧
see product details
SYNOPSIS
An authoritative reference book on EUV source technology. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation.
DETAILS
| Property | Description |
|---|---|
| ISBN: | 9780819496256 |
| Publisher: | SPIE PRESS |
| Release Date: | February of 2006 |
| Language: | English |
| Dimensions: | 152 x 229 x 20 mm |
| Cover: | Softcover |
| Pages: | 1094 |
| Format: | Book |
| Collection: | Press Monograph |
| Categories: |
Books in English
>
Engineering
>
General Engineering
|
| EAN: | 9780819496256 |
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