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Computational Lithography eBook

by Xu Ma e Gonzalo R. Arce
language: english
Publisher: WILEY, January of 2011 ‧
140,38€
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This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

Computational Lithography

by Xu Ma e Gonzalo R. Arce

Property Description
ISBN: 9781118043578
Publisher: WILEY
Release Date: January of 2011
Language: English
Format: eBook
File Format and Compatibility:
Categories: eBooks in English > Engineering > Electricity and Energy
EAN: 9781118043578
Acessibilidade: Ver características de acessibilidade indicadas pelo editor