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Computational Lithography

by Xu Ma e Gonzalo R. Arce
language: english
Publisher: JOHN WILEY & SONS INC, August of 2010 ‧
143,23€
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This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

Computational Lithography

by Xu Ma e Gonzalo R. Arce

Property Description
ISBN: 9780470596975
Publisher: JOHN WILEY & SONS INC
Release Date: August of 2010
Language: English
Cover: Hardcover
Pages: 256
Format: Book
Collection: Wiley Series In Pure And Applied Optics
Categories: Books in English > Engineering > Electricity and Energy
Books in English > Others
EAN: 9780470596975