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Computational Lithography eBook

by Xu Ma e Gonzalo R. Arce
language: english
Publisher: WILEY, July of 2010 ‧
140,38€
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Ebook for ADE
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

Computational Lithography

by Xu Ma e Gonzalo R. Arce

Property Description
ISBN: 9780470618936
Publisher: WILEY
Release Date: July of 2010
Language: English
Format: eBook
File Format and Compatibility: PDF para ADE
Collection: Wiley Series In Pure And Applied Optics
Categories: eBooks in English > Engineering > Electricity and Energy
EAN: 9780470618936