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Computational Lithography
idioma: inglês
Editor:
JOHN WILEY & SONS INC, agosto de 2010 ‧
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143,23€
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SINOPSE
This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.
DETALHES
| Propriedade | Descrição |
|---|---|
| ISBN: | 9780470596975 |
| Editor: | JOHN WILEY & SONS INC |
| Data de Lançamento: | agosto de 2010 |
| Idioma: | Inglês |
| Encadernação: | Capa dura |
| Páginas: | 256 |
| Tipo de produto: | Livro |
| Coleção: | Wiley Series In Pure And Applied Optics |
| Classificação Temática: |
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| EAN: | 9780470596975 |
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