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Design For Manufacturability With Advanced Lithography

by Bei Yu e David Z. Pan
language: english
Publisher: Springer International Publishing AG, August of 2016 ‧
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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).

Design For Manufacturability With Advanced Lithography

by Bei Yu e David Z. Pan

Property Description
ISBN: 9783319373935
Publisher: Springer International Publishing AG
Release Date: August of 2016
Language: English
Dimensions: 155 x 235 x 20 mm
Cover: Softcover
Pages: 164
Format: Book
Categories: Books in English > Engineering > Electricity and Energy
EAN: 9783319373935