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Atomic Layer Deposition

Principles, Characteristics, And Nanotechnology Applications

by David Cameron, Marja-Leena Kaariainen, Tommi Kaariainen e Arthur Sherman
language: english
Publisher: JOHN WILEY & SONS INC, June of 2013 ‧
236,51€
165,56€
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.

Atomic Layer Deposition

Principles, Characteristics, And Nanotechnology Applications

by David Cameron, Marja-Leena Kaariainen, Tommi Kaariainen e Arthur Sherman

Property Description
ISBN: 9781118062777
Publisher: JOHN WILEY & SONS INC
Release Date: June of 2013
Language: English
Cover: Hardcover
Pages: 272
Format: Book
Categories: Books in English > Engineering > Electricity and Energy
EAN: 9781118062777