Plasma Etching Processes For Interconnect Realization In Vlsi

by Nicolas Posseme
language: english
Publisher: ISTE Press Ltd - Elsevier Inc, April of 2015 ‧
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This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.

Plasma Etching Processes For Interconnect Realization In Vlsi

by Nicolas Posseme

Property Description
ISBN: 9781785480157
Publisher: ISTE Press Ltd - Elsevier Inc
Release Date: April of 2015
Language: English
Dimensions: 152 x 229 x 8 mm
Cover: Hardcover
Pages: 128
Format: Book
Collection: New Metaphysics
Categories: Books in English > Engineering > Electricity and Energy
EAN: 9781785480157

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